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- ion etching and an analysis of the samples surface by means of method of the Auger spectroscopy; - diffraction of the slow electrons; - cooling of the sample up to the liquid helium temperature; - transportation of the samples from an atmosphere to the research chamber; - evaporation of an each films including an ion plasma method; - crystal cut; - measurement of the conductivity of the evaporated films in situ. |
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Operation conditions: - modes of contact and lateral microscopy; - mode of the resonant microscopy with the system of an electron damping of the cantilevers Q - factor; - opportunity of registration of the module, the amplitude projections of signal, excited the oscillations, opportunity of the registration of the fractional harmonics with highest frequency up to 1.8 MHz; - magnetoforce mode and mode of the registration of the electrical forces; - Kelvin mode, capacitive mode (registration regimes of the local static not uniformity of the dopants distribution and in semiconductors and static charge not uniformity); - STM mode and SPM modes for the registration of the distribution of the binding energy and the density of the states; - current mode with the simultaneous registration of the topographical characteristics of surface; - STM - SFM two - way mode; - adhesive mode; - nanolithography unit regime with a possibility of an implementation of the modulation tensoinduced modification of the surface; - scan size - up to 1000 x 1000 points; - scanners: 10 x 10 x 1.5 mm (for the researches of "rough" surfaces and nanomanipulations, nanoindentation, nanolithography); Resolution of SPM: - STM mode: atom resolution on Si (111) and Au (111); - contact SFM mode: atom resolution on the mica and Au (111); - contactless SFM mode: atom resolution on Si (111). It will be provided the possibility of the manipulation change of the cantilevers and samples under conditions of the super high vacuum. The temperature of an sample: (at work with PhS) 4 - 1000 K, the temperature of an sample (at work with SPM) 90 - 450K, operating vacuum - 10 annealing temperature ~ 160°C. |