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Operation conditions: - modes of contact and lateral microscopy; - mode of the resonant microscopy with the system of an electron damping of the cantilevers Q - factor; - opportunity of registration of the module, the amplitude projections of signal, excited the oscillations, opportunity of the registration of the fractional harmonics with highest frequency up to 1.8 MHz; - magnetoforce mode and mode of the registration of the electrical forces; - Kelvin mode, capacitive mode (registration regimes of the local static not uniformity of the dopants distribution and in semiconductors and static charge not uniformity); - STM mode and SPM modes for the registration of the distribution of the binding energy and the density of the states; - current mode with the simultaneous registration of the topographical characteristics of surface; - STM - SFM two - way mode; - adhesive mode; - nanolithography unit regime with a possibility of an implementation of the modulation tensoinduced modification of the surface; Resolution of SPM: - STM mode: atom resolution on the monocrystalline pyrolytic graphite; - contact SFM mode: atom resolution on the mica; |