The name of the project
Processes of the forming of the interphase interfaces, induced by an ultraviolet radiation, at the synthesis of the micro-, nano- and biostructures
The contents of works

It is supposed to research the mechanisms and the optimum technological conditions of the low temperature (less 200°C) forming of an interface by means of UV induced multilayer chemisorption of the gaseous reagents on the surface of the solid states of the crystalline (semiconductors) and noncrystalline (polymers) nature.
The decision of this problem will become possible at joining of the vapor processes of a deep (0.1 monolayer) cleaning of the surface from the carbon contained and oxygen contained impurities, it chemical notification and/or a precision deposition (0.5 - 1.0 monolayer) of the functional layer including in situ researches of the surface states by means X - ray electron spectroscopy in a single high vacuum cycle. It will allow to exclude during researches influence of uncontrollable impurity and defects and adequately to estimate the mechanism of formation of surfaces with the given properties.
On the first stage of such cycle a surface is cleaned from the impurities of an organic and inorganic character. The substrate surface is become practically atomic - clean with defects which quantity is equal to the quantity of the surface atoms with the noncompensated chemical bonds ("fast" surface states). Further without break of a work cycle modifying a surface is carried out and/or the deposition of the functional layer by means of the multilayer chemisorption (molecular deposition), induced by the UV - radiation, that will allow to decrease the level of the surface defects owing to the connecting of the necessary functional groups of the molecules of reaction gases to the free chemical bonds.
On the basis of theoretical representations will be investigated a kinetics and mechanism of the chemisorption of the functional groups of molecules of the gaseous environment, induced by the UV radiation in view of their spatial sizes and determined the influence of the steric factor on the quantity of "cured" surface defects.
The state of the surface on the each stage of an operation cycle will be controlled by means of X - ray electron spectroscopy, which will allow to determine with the high sensitivity the chemical state of the surface, and, consequently, the mechanisms of the formation of an interface of the implemented structures.
Thus, the novelty of offered methods consists in the following:
1) research of the processes of the cleaning, chemical modification and/or a deposition of the functional layers under condition of the high vacuum and the UV influence, integrated in a space and a time (an appropriate multimode high vacuum unit is present);
2) implementation in situ of X - ray electron spectroscopy of the surface analysis for the determination of the real mechanism of the formation of the defectless interfaces;
3) use of the principles of the geometrical accordance of the chemisorptionable molecules and the functional groups with the sizes of the structural units of the solid state of the crystal nature for the providing of the maximal "curing" of the surface defects;
4) realization of the controlled multilayer synthesis on the surface of a solid states of noncrystal nature by means of the body of solid substance in kind of structures units of cluster type of sizes 5 - 12 nm, which in an each concrete case will serve or by passive, either active part of the surface at the contact with the reaction environments.

Expected results
- development of the low temperature vapor cleaning of the semiconductor surface (Si, GaAs, InSb) from the impurities of the organic and inorganic character;
- research of the integrated processes of the cleaning, modification and/or a deposition of the functional layer for the formation of the interfaces of the micro- and nanoelectron structures;
- realization of the biocompatible structures on the surface of the polymers for the medical purposes owing to the formation of the cluster structures, possessed by the selective capability to an adsorption of the albumen of the blood plasma.

Application field of the results
Micro- and nanoelectronics, including the realization of the heterojunctions, epitaxial structures, MOS structures and IC on their base; medical material science, including for the implantational surgery.